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Proceedings Paper

Development of a miniature multi-degree-of-freedom measurement system for ultra precision stages
Author(s): Hung-Yu Wang; Bo-Hsun Liao; Ming-Jun Chou; Yang-Yu Tseng; Kuang-Chao Fan
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Paper Abstract

Any linear stage has inherent geometrical errors due to manufacturing errors. The induced Abbé errors have to be compensated for the accuracy of positioning. In addition, although the commercial laser interferometer is capable for the displacement sensing to nanometer resolution, it is, however, bulky in size, expensive in cost and not able to correct the Abbé errors caused by angular errors of the moving stage. In order to minimize and simplify the interferometer as a practically useful sensor for nanopositiong stages in industrial use, this paper presents a newly developed miniature multi-degree-of-freedom measurement system (MDFMS), which is constructed by a wavelength corrected Michelson interferometer and a dual-axis autocollimator. The wavelength correction of the miniature laser interferometer is calibrated by SIOS and controlling the temperature within ±2 ºC, the wavelength stability is less than 10-6. After calibration, the accuracy of the miniature laser interferometer can reach 32 nm for the travel of 20 mm long. The collimator has accuracy of ±0.3 arc-sec within the range of ±30 arc-sec. This MDFMS has been integrated into the developed Micro-CMM as a feedback sensor in each axis of the coplanar stage.

Paper Details

Date Published: 10 October 2013
PDF: 8 pages
Proc. SPIE 8916, Sixth International Symposium on Precision Mechanical Measurements, 89160A (10 October 2013); doi: 10.1117/12.2035495
Show Author Affiliations
Hung-Yu Wang, National Taiwan Univ. (Taiwan, China)
Bo-Hsun Liao, National Taiwan Univ. (Taiwan, China)
Ming-Jun Chou, National Taiwan Univ. (Taiwan, China)
Yang-Yu Tseng, National Taiwan Univ. (Taiwan, China)
Kuang-Chao Fan, National Taiwan Univ. (Taiwan, China)


Published in SPIE Proceedings Vol. 8916:
Sixth International Symposium on Precision Mechanical Measurements
Shenghua Ye; Yetai Fei, Editor(s)

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