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Proceedings Paper

CO2 laser photosensitized decomposition of diethylsilane for deposition of SixC1-x coatings
Author(s): M. Jakoubkova; Z. Bastl; J. Subrt; D. Cukanova; Radek Fajgar; Josef Pola
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Paper Abstract

CO2 laser photosensitized (SF6) decomposition of diethylsilane proceeds via molecular extrusion of ethene and affords solid Si/C/H materials which possess both Si-C and Si contributions, contain some fluorine from the sensitizing sulphur hexafluoride, and react with ambient atmosphere to incorporate oxygen.

Paper Details

Date Published: 8 March 1995
PDF: 3 pages
Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); doi: 10.1117/12.203524
Show Author Affiliations
M. Jakoubkova, Institute of Chemical Process Fundamentals (Czech Republic)
Z. Bastl, J. Heyrovsky Institute of Physical Chemistry (Czech Republic)
J. Subrt, Institute of Inorganic Chemistry (Czech Republic)
D. Cukanova, Institute of Chemical Process Fundamentals (Czech Republic)
Radek Fajgar, Institute of Chemical Process Fundamentals (Czech Republic)
Josef Pola, Institute of Chemical Process Fundamentals (Czech Republic)


Published in SPIE Proceedings Vol. 2461:
ROMOPTO '94: Fourth Conference in Optics
Valentin I. Vlad, Editor(s)

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