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Proceedings Paper

Deposition of metallic thin layers by photolytic versus thermal-laser-induced processes
Author(s): Rodica Alexandrescu; A. Andrei; Raluca Cireasa; Ion G. Morjan; Ioan Ursu; Letitia Voicu
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Paper Abstract

Laser-assisted processes for metal-based thin films deposition are currently using vapor-phase precursors. Either photolytic or thermal, the mechanisms developed during laser-induced interaction between adsorbed precursor and substrate are imposing different trends to the composition and morphology of the growing metallic layer. Various aspects of the dynamics of film growth are discussed, in connection with the deposition of titanium from titanium tetrachloride.

Paper Details

Date Published: 8 March 1995
PDF: 7 pages
Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); doi: 10.1117/12.203522
Show Author Affiliations
Rodica Alexandrescu, Institute of Atomic Physics (Romania)
A. Andrei, Institute for Energetical Nuclear Reactors (Romania)
Raluca Cireasa, Institute of Atomic Physics (Romania)
Ion G. Morjan, Institute of Atomic Physics (Romania)
Ioan Ursu, Institute of Atomic Physics (Romania)
Letitia Voicu, Institute of Atomic Physics (Romania)


Published in SPIE Proceedings Vol. 2461:
ROMOPTO '94: Fourth Conference in Optics
Valentin I. Vlad, Editor(s)

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