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Proceedings Paper

Study on dark current of extended wavelength InGaAs detectors
Author(s): Xue Li; Hengjing Tang; Tao Li; Peng Wei; Haimei Gong; Jiaxiong Fang
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Paper Abstract

The short wavelength infrared (SWIR) band near 1.0-3.0μm plays an important role in many applications such as weather forecast, earth environmental or resource observation, low light level systems and astronomical observation. It is well known that InGaAs detectors can shift the cutoff wavelength from 1.7μm to 2.5μm with the higher fraction of indium in the ternary InXGa1-XAs material grown on InP, which results to material defects and poorer device characteristics due to the lattice mismatch. Dark current characteristics of extended wavelength InGaAs detectors were investigated in this paper. Dark current mechanisms for extended InGaAs detectors with different absorption layer parameters and device fabrication process were analyzed according to current-voltage curves at different temperatures and bias voltages. Activation energy of devices was extracted from current-voltage curves. Activation energy is related with absorption layer concentration and test temperature. Activation energy is the higher for the devices with the higher absorption layer concentration at lower bias voltage at the same temperature range, which shows that the narrower width of the depletion layer in the devices results to the lower generation-recombination current. The devices with the optimized etching and passivation parameters show higher thermal activation energy and the lower dark current. Dark current mechanisms of the ones are dominated by diffusion current at the higher temperature and lower bias voltage, whereas dominated by internal generation-recombination current and ohmic leakage current at the lower temperature.

Paper Details

Date Published: 11 September 2013
PDF: 9 pages
Proc. SPIE 8907, International Symposium on Photoelectronic Detection and Imaging 2013: Infrared Imaging and Applications, 890703 (11 September 2013); doi: 10.1117/12.2034986
Show Author Affiliations
Xue Li, Shanghai Institute of Technical Physics (China)
Hengjing Tang, Shanghai Institute of Technical Physics (China)
Tao Li, Shanghai Institute of Technical Physics (China)
Peng Wei, Shanghai Institute of Technical Physics (China)
Haimei Gong, Shanghai Institute of Technical Physics (China)
Jiaxiong Fang, Shanghai Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 8907:
International Symposium on Photoelectronic Detection and Imaging 2013: Infrared Imaging and Applications
Haimei Gong; Zelin Shi; Qian Chen; Jin Lu, Editor(s)

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