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Proceedings Paper

Off-axis illumination of lithography tool
Author(s): Han Xing; Li Lin; Ma Bin
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Paper Abstract

Lithography tool is a necessary part for LSI and VLSI. The illumination system design is an important part in the lithography optical system design. Off-axis illumination technology is an effective way to reducing resolution of lithography. The paper introduction the basic components of lithography tool, the principle of off-axis illumination reducing the resolution of lithography and focus on the two implementations of OAI technology, finally point out advantages and disadvantage of the two implementations.

Paper Details

Date Published: 31 December 2013
PDF: 7 pages
Proc. SPIE 9042, 2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 90420U (31 December 2013); doi: 10.1117/12.2034891
Show Author Affiliations
Han Xing, Beijing Institute of Technology (China)
Li Lin, Beijing Institute of Technology (China)
Ma Bin, Institute of Optics, Univ. of Rochester (United States)


Published in SPIE Proceedings Vol. 9042:
2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments
Yongtian Wang; Xiaocong Yuan; Yunlong Sheng; Kimio Tatsuno, Editor(s)

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