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Proceedings Paper

Enhancement of third harmonics generation during ultrashort pulse diffraction in multi-layer volume grating
Author(s): Yizhou Tan; Yisheng Yang; Jiali Liao; Ming Zhang
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Paper Abstract

Successful phase-matching methods for Third Harmonics Generation (THG) include phase-matching in birefringent crystal and quasi-phase-matching (QPM) in crystal with periodically poled domains. However, these methods are not feasible in some isotropic materials (e.g. fused silica and photosensitive silicate glass). It was known that volume-grating in isotropic materials can independently generate frequency-converted waves. One of disadvantages of single-layer volumegrating is that the brightness of harmonic emission can not be enhanced by increasing the grating thickness. In this paper, a THG device with stratified sub-gratings was designed to enhance THG in isotropic materials: several sub-gratings were arranged parallel, and the grating-figures misalignment between neighboring sub-gratings was pre-fabricated. In terms of extension of interaction length in THG, our multi-layer sub-grating is formally equivalent to the multi-layer periodically poled crystal (e.g. lithium niobate) in conventional QPM approach. According to the calculation results, the N-layer (N <2) can, in principle, generate TH output intensity of N2 times stronger than single-layer volume-grating does, also compared to N times stronger than N-layer without figures-misalignment. The effect of random fabrication error in grating thickness on normalized conversion efficiency was discussed.

Paper Details

Date Published: 17 September 2013
PDF: 7 pages
Proc. SPIE 8904, International Symposium on Photoelectronic Detection and Imaging 2013: High Power Lasers and Applications, 89041F (17 September 2013); doi: 10.1117/12.2034729
Show Author Affiliations
Yizhou Tan, National Univ. of Defense Technology (China)
Yisheng Yang, National Univ. of Defense Technology (China)
Jiali Liao, National Univ. of Defense Technology (China)
Ming Zhang, National Univ. of Defense Technology (China)


Published in SPIE Proceedings Vol. 8904:
International Symposium on Photoelectronic Detection and Imaging 2013: High Power Lasers and Applications
Andreas Tünnermann; Zejin Liu; Pu Wang; Chun Tang, Editor(s)

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