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Proceedings Paper

Cryogenic optical profilometry for the calculation of coefficient of thermal expansion in thin films
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Paper Abstract

This work focuses on the development of a cryogenic optical profilometry system for the measurement of material properties of thin films across a wide temperature range. A cryostat was machined and integrated with a Zygo NewView 600K optical profilometer and vacuum system. Curvature data were taken for a SiNx thin film on a GaAs substrate from 300 K down to 80 K. From the curvature data, the coefficient of thermal expansion was calculated. The cryogenic optical profilometry system was benchmarked with a three beam curvature technique, and demonstrated excellent agreement across the full temperature range from 300 K to 80 K

Paper Details

Date Published: 7 December 2013
PDF: 6 pages
Proc. SPIE 8923, Micro/Nano Materials, Devices, and Systems, 89231V (7 December 2013); doi: 10.1117/12.2033802
Show Author Affiliations
Kirsten L. Brookshire, The Univ. of Western Australia (Australia)
Ramin Rafiei, The Univ. of Western Australia (Australia)
Mariusz Martyniuk, The Univ. of Western Australia (Australia)
K. K. M. B. Dilusha Silva, The Univ. of Western Australia (Australia)
John Bumgarner, The Univ. of Western Australia (Australia)
Robert W. Basedow, The Univ. of Western Australia (Australia)
Yinong Liu, The Univ. of Western Australia (Australia)
Lorenzo Faraone, The Univ. of Western Australia (Australia)

Published in SPIE Proceedings Vol. 8923:
Micro/Nano Materials, Devices, and Systems
James Friend; H. Hoe Tan, Editor(s)

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