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Proceedings Paper

Ion-beam and plasma etching of a conical-pores photonic crystal for thin-film solar cell
Author(s): Gediminas Gervinskas; Lorenzo Rosa; Saulius Juodkazis
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Paper Abstract

Conical holes bored in the active layer of a thin-film silicon solar cell by ion-beam lithography (IBL) show increase of effective optical absorption in the underlying silicon active layer. The optical properties are numerically simulated by the 3D finite-difference time-domain method (3D-FDTD), showing wideband increase of the UV, visible, and IR quantum efficiency. An experimental fabrication procedure is developed using IBL for high wide- area repeatability. A further optimization on the cone shapes is performed in order to make fabrication feasible with plasma etching techniques.

Paper Details

Date Published: 7 December 2013
PDF: 8 pages
Proc. SPIE 8923, Micro/Nano Materials, Devices, and Systems, 89232G (7 December 2013); doi: 10.1117/12.2033762
Show Author Affiliations
Gediminas Gervinskas, Swinburne Univ. of Technology (Australia)
Australian National Fabrication Facility (Australia)
Lorenzo Rosa, Swinburne Univ. of Technology (Australia)
Australian National Fabrication Facility (Australia)
Saulius Juodkazis, Swinburne Univ. of Technology (Australia)
Australian National Fabrication Facility (Australia)


Published in SPIE Proceedings Vol. 8923:
Micro/Nano Materials, Devices, and Systems
James Friend; H. Hoe Tan, Editor(s)

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