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Proceedings Paper

A review of developments in the preparation methods of tantalum pentoxide film
Author(s): Shuilan Hu; Runling Peng; Yifan Li; Jiabi Chen
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Paper Abstract

Tantalum pentoxide film has a huge application potential in microelectronic field owing to its good chemical stability and thermal stability, and its good compatibility with semiconductor integrated circuit. In addition, Tantalum pentoxide film also has a high dielectric constant, a high refractive index, low absorption rate and a wide spectral range from 300nm to 1000nm in the visible spectral region. At present, it has a wide application in antireflection coatings, lasers, optical communication, solar wafers and so on. This review will focus on the preparation methods of Tantalum pentoxide film, and tantalum pentoxide film’s property and application, which are better for us to choose an appropriate method in an appropriate occasion.

Paper Details

Date Published: 23 August 2013
PDF: 6 pages
Proc. SPIE 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications, 89110B (23 August 2013); doi: 10.1117/12.2033531
Show Author Affiliations
Shuilan Hu, Univ. of Shanghai for Science and Technology (China)
Runling Peng, Univ. of Shanghai for Science and Technology (China)
Yifan Li, Univ. of Shanghai for Science and Technology (China)
Jiabi Chen, Univ. of Shanghai for Science and Technology (China)


Published in SPIE Proceedings Vol. 8911:
International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
Min Gu; Xiaocong Yuan; Min Qiu, Editor(s)

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