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Proceedings Paper

Enhanced optical second-harmonic generation from current-biased graphene on the substrates of Si and SiC
Author(s): Yong Q. An; Daniel B. Dougherty; Jack E. Rowe; Andreas Sandin; Ji Ung Lee; Alain C. Diebold
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Paper Abstract

We find that optical second-harmonic generation (SHG) in reflection from a chemical-vapor-deposition (CVD) graphene monolayer transferred onto a SiO2/Si(001) substrate is enhanced about 3 times by the flow of direct (dc) electric current in graphene. We also find that optical SHG in reflection from a 4-layer-graphene film epitaxially grown on a vicinal SiC(0001) substrate is enhanced 25% by the flow of dc electric current in graphene. Measurements of rotationalanisotropy SHG from both samples revealed that the current-induced SHG varies strongly with the measurement location on graphene along the current flow direction. The enhancement of SHG from the graphene/SiO2/Si(001) sample is due to current-associated charge trapping at the graphene/SiO2 interface, which introduces a vertical electric field across the SiO2/Si interface that produces electric field-induced SHG. The enhancement of SHG from the graphene/vicinal-SiC(0001) sample is due to the current-associated electric field at the graphene/SiC interface that produces electric field-induced SHG. The functions of the current-induced SHG varying with the measurement location are different for the CVD graphene/SiO2/Si(001) sample and the epitaxial graphene/vicinal-SiC(0001) sample.

Paper Details

Date Published: 28 September 2013
PDF: 13 pages
Proc. SPIE 8845, Ultrafast Imaging and Spectroscopy, 88451B (28 September 2013); doi: 10.1117/12.2033421
Show Author Affiliations
Yong Q. An, Univ. at Albany (United States)
Daniel B. Dougherty, North Carolina State Univ. (United States)
Jack E. Rowe, North Carolina State Univ. (United States)
Andreas Sandin, North Carolina State Univ. (United States)
Ji Ung Lee, Univ. at Albany (United States)
Alain C. Diebold, Univ. at Albany (United States)

Published in SPIE Proceedings Vol. 8845:
Ultrafast Imaging and Spectroscopy
Zhiwen Liu, Editor(s)

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