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Proceedings Paper

Influences of temperature and concentrations on morphology of TMAH anisotropic etching for silicon microchannel plate
Author(s): Yong-zhao Liang; Qing-duo Duanmu; Ji-kai Yang; Guo-zheng Wang; Jin Chai; Fengyuan Yu; Yao Zhang; Shu-xiao Fan
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Paper Abstract

Anisotropic etching of monocrystalline silicon plays an important role in Microsystems technology in the recent years. TMAH, as one of the anisotropic etchants, is used to fabricate pores with square cross-section. Careful choice of concentration, isopropyl alcohol additives and temperature of alkaline solution allows for certain crystallographic directions to be preferentially etched. In this way, pores with square, eight-sided (octagonal) or rotated square shapes can be attained and convert to each other. We show the etch selectivity on (100) and (110) planes in TMAH solution with low concentration. The etch rates on (100) and (110) planes at different temperature and concentration has been measured. The results indicated that the perfect orthogonal array of pores with sharp edges and corners can be obtained at more than 40℃ in 1wt% TMAH solution. There is good etch selectivity on (110) surface and the etch rate on (110) surface is slower than (100) surface under the condition.

Paper Details

Date Published: 16 August 2013
PDF: 6 pages
Proc. SPIE 8912, International Symposium on Photoelectronic Detection and Imaging 2013: Low-Light-Level Technology and Applications, 89120B (16 August 2013); doi: 10.1117/12.2032481
Show Author Affiliations
Yong-zhao Liang, Changchun Univ. of Science and Technology (China)
Qing-duo Duanmu, Changchun Univ. of Science and Technology (China)
Ji-kai Yang, Changchun Univ. of Science and Technology (China)
Guo-zheng Wang, Changchun Univ. of Science and Technology (China)
Jin Chai, Changchun Univ. of Science and Technology (China)
Fengyuan Yu, Changchun Univ. of Science and Technology (China)
Yao Zhang, Changchun Univ. of Science and Technology (China)
Shu-xiao Fan, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 8912:
International Symposium on Photoelectronic Detection and Imaging 2013: Low-Light-Level Technology and Applications
Benkang Chang; Hui Guo, Editor(s)

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