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Proceedings Paper

Thermal probe nanolithography: in-situ inspection, high-speed, high-resolution, 3D
Author(s): Felix Holzner; Philip Paul; Michel Despont; Lin Lee Cheong; James Hedrick; Urs Dürig; Armin Knoll
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Paper Abstract

Heated tips offer the possibility to create arbitrary high-resolution nanostructures by local decomposition and evaporation of resist materials. Turnaround times of minutes are achieved with this patterning method due to the high-speed direct-write process and an in-situ imaging capability. Dense features with 10 nm half-pitch can be written into thin films of organic resists such as self-amplified depolymerization (SAD) polymers or molecular glasses. The patterning speed of tSPL has been increased far beyond usual scanning probe lithography (SPL) technologies and approaches the speed of Gaussian shaped electron beam lithography (EBL) for <30 nm resolution. A single tip can write complex patterns with a pixel rate of 500 kHz and a linear scan speed of 20 mm/s. Moreover, a novel scheme for stitching was developed to extend the patterning area beyond the ≤100 μm range of the piezo stages. A stitching accuracy of 10 nm is obtained without the use of markers. Furthermore, the patterning depth can be controlled independently and accurately (~1 nm) at each position. Thereby, arbitrary 3D structures can be written in a single step. Finally, we demonstrated an all-dry tri-layer pattern transfer concept to create high aspect ratio structures in silicon. Dense fins and trenches with 27 nm half-pitch and a line edge roughness (LER) below 3nm (3σ) have been fabricated.

Paper Details

Date Published: 1 October 2013
PDF: 9 pages
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 888605 (1 October 2013); doi: 10.1117/12.2032318
Show Author Affiliations
Felix Holzner, Swiss Litho AG (Switzerland)
IBM Zurich Research Lab. (Switzerland)
ETH Zurich (Switzerland)
Philip Paul, Swiss Litho AG (Switzerland)
IBM Zurich Research Lab. (Switzerland)
inspire AG (Switzerland)
Michel Despont, IBM Zurich Research Lab. (Switzerland)
Lin Lee Cheong, IBM Zurich Research Lab. (Switzerland)
Massachusetts Institute of Technology (United States)
James Hedrick, IBM Almaden Research Ctr. (United States)
Urs Dürig, IBM Zurich Research Lab. (Switzerland)
Armin Knoll, IBM Zurich Research Lab. (Switzerland)

Published in SPIE Proceedings Vol. 8886:
29th European Mask and Lithography Conference
Uwe F. W. Behringer; Wilhelm Maurer, Editor(s)

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