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Proceedings Paper

2013 Photomask Japan panel discussion summary: Future mask patterning technologies in the next decade: searching for the best mix solution
Author(s): Noriaki Nakayamada; Ichiro Kagami
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Paper Abstract

This paper gives a review and summary of the key messages from the 2013 PMJ panel discussion topic: “Future mask patterning technologies in the next decade: searching for the best mix solution." The results of the special survey conducted for the panel are reviewed along with a brief summary of each panelist’s point of view.

Paper Details

Date Published: 9 September 2013
PDF: 9 pages
Proc. SPIE 8880, Photomask Technology 2013, 888015 (9 September 2013); doi: 10.1117/12.2032072
Show Author Affiliations
Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
Ichiro Kagami, Sony Semiconductor Co. (Japan)


Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)

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