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Proceedings Paper

Analysis of process parameters of micro fluid-jet polishing on the processing effect
Author(s): Shaozhi Wang; Jian Liu; Linghua Zhang
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Paper Abstract

Micro fluid-jet polishing technology is a new kind of ultra-smooth machining method which proposed on the basis of float polishing principle and combined with small tool polishing. This article will use micro jet ultra-smooth machine which developed by ourselves to develop the process experiment for plane elements. In the experiment, the material removal rate and surface roughness are taken as the assessment index, and the orthogonal experiment method is used to study the processing effect of different process parameters, such as the spindle speed, the pressure of the grinding head and the abrasive concentration. On the basis of the experimental results and combined with the micro jet polishing mechanism, the processing effect law of the various process parameters is analyzed. It shows that, the influence of polishing pressure and abrasive concentration on the removal efficiency is single, that is to say, the removal efficiency can be increased either by increasing the polishing pressure or by increasing the concentration of the slurry. However, the influence of the grinding speed on removal efficiency is not simple, the removal efficiency can be increased by increasing the grinding speed in the certain range, if continue to increase, the removal efficiency will decrease. The influence of the process parameters on the roughness is more complex, but it can be summarized grossly as follows: if the roughness is required to reduce quickly, the large polishing pressure and high concentration slurry can be chosen, but it has a large depth of removal; if the roughness is required to reduce and the removal depth is as small as possible, the little polishing pressure and the dilute polishing liquid can be chosen, but it has a long polishing time. So in the actual processing, the process parameters should be adjusted according to different machining needs, to finally reach the optimization.

Paper Details

Date Published: 16 August 2013
PDF: 7 pages
Proc. SPIE 8912, International Symposium on Photoelectronic Detection and Imaging 2013: Low-Light-Level Technology and Applications, 891205 (16 August 2013); doi: 10.1117/12.2031669
Show Author Affiliations
Shaozhi Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jian Liu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Linghua Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 8912:
International Symposium on Photoelectronic Detection and Imaging 2013: Low-Light-Level Technology and Applications
Benkang Chang; Hui Guo, Editor(s)

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