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Proceedings Paper

Chemical etching process for PANDA polarization-maintaining fiber in HiBi fiber loop mirror
Author(s): Jing Wang; Ciming Zhou; Angui Zheng
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Paper Abstract

Chemical etching process for PANDA polarization-maintaining fiber (PMF) in HiBi fiber loop mirror (FLM) is studied detailedly in this paper. The PMF is inserted into the FLM whose etched length is about 3cm. Due to decrease of the fiber diameter, the whole wavelengths of transmission dips shift to the short wavelength because of the reduction of birefringence when the PMF is etched. The result shows that the wavelength spacing between two interference minima increases from 19nm to 22nm when chemical etching ends, the thinned PMF is sensitive to the external environment and can be applied to many biochemistry sensing applications.

Paper Details

Date Published: 15 October 2013
PDF: 4 pages
Proc. SPIE 8924, Fourth Asia Pacific Optical Sensors Conference, 89242T (15 October 2013); doi: 10.1117/12.2031659
Show Author Affiliations
Jing Wang, Wuhan Univ. of Technology (China)
Ciming Zhou, Wuhan Univ. of Technology (China)
Angui Zheng, Wuhan Univ. of Technology (China)


Published in SPIE Proceedings Vol. 8924:
Fourth Asia Pacific Optical Sensors Conference
Minghong Yang; Dongning Wang; Yun-Jiang Rao, Editor(s)

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