Share Email Print
cover

Proceedings Paper

Design and simulation of double annular illumination mode for microlithography
Author(s): Qiang Song; Jing Zhu; Baoxi Yang; Lei Liu; Jun Wang; Huijie Huang
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Methods of generating various illumination patterns remain as an attractive and important micro-optics research area for the development of resolution enhancement in advanced lithography system. In the current illumination system of lithography machine, off-axis illumination is widely used as an effective approach to enhance the resolution and increase the depth of focus (DOF). This paper proposes a novel illumination mode generation unit, which transform conventional mode to double annular shaped radial polarized (DARP) mode for improving the resolution of micro-lithography. Through LightToolsTM software simulation, double annular shaped mode is obtained from the proposed generation unit. The mathematical expressions of the radius variation of inner and outer rings are deduced. The impacts of conventional and dual concentric annular illumination pattern on critical dimension uniformity were simulated on an isolated line, square hole and corner. Lithography performance was compared between DARP illumination mode and corresponding single annular modes under critical dimension of 45nm. As a result, DARP illumination mode can improve the uniformity of aerial image at 45nm node through pitch varied in 300-500 nm to a certain extent.

Paper Details

Date Published: 23 August 2013
PDF: 10 pages
Proc. SPIE 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications, 891105 (23 August 2013); doi: 10.1117/12.2031650
Show Author Affiliations
Qiang Song, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Jing Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Baoxi Yang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Lei Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Jun Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 8911:
International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications
Min Gu; Xiaocong Yuan; Min Qiu, Editor(s)

© SPIE. Terms of Use
Back to Top