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Proceedings Paper

Status of the AIMS EUV development project
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Paper Abstract

The need for an actinic wavelength AIMS™ EUV tool by 2014 has been defined by SEMATECH due to the challenges associated with EUV mask manufacture and defectivity. The AIMS™ EUV development project began in June of 2011 as a collaboration between ZEISS and the SEMATECH EUVL Mask Infrastructure (EMI) consortium. The project remains on track to meet the first commercial tool shipment in September 2014. The current design status of the system after two years as well as recent progress in the prototype build will be presented.

Paper Details

Date Published: 1 October 2013
PDF: 6 pages
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 88860I (1 October 2013); doi: 10.1117/12.2031611
Show Author Affiliations
Anthony Garetto, Carl Zeiss SMS GmbH (Germany)
Jan Hendrik Peters, Carl Zeiss SMS GmbH (Germany)
Dirk Hellweg, Carl Zeiss SMT (Germany)
Markus Weiss, Carl Zeiss SMT (Germany)

Published in SPIE Proceedings Vol. 8886:
29th European Mask and Lithography Conference
Uwe F. W. Behringer; Wilhelm Maurer, Editor(s)

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