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Proceedings Paper

Fabrication and measurement of micromechanical bridge structures for mass change detection
Author(s): Magdalena M. Moczała; Andrzej Sierakowski; Rafał Dobrowolski; Piotr Grabiec; Teodor P. Gotszalk
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Paper Abstract

Microelectromechanical systems (MEMS) and nanoelectromechanical systems (NEMS) are the promising platforms for mass change observations. These systems in optimal solutions allow to observe the deposition of single molecules. This is achieved by the structure miniaturization which entails increase of resolution. In this paper, we present fabrication process of silicon nitride double-clamped beam structures. Moreover, it is presented the basic description of the beam mechanics which is based on the Euler-Bernoulli beam theory. Additionally results of the measurements of the fabricated devices are shown. Thanks to the possibility of recording force curves at nanometer deflections using atomic force microscopy (AFM) system there is a possibility to determine the properties of the MEMS and/or NEMS devices. The obtained experimental results show that the parameters of the fabricated structures differ basing on the theoretical ones, which were calculated from the elasticity theory. This results from the stress in the silicon nitride film, which forms the elastic beam structure and from the stress in the metallization deposited on the bridge. The influence of the described factors on the bridge structure properties is also described. Bridge structures with thickness of 120 nm, width and length ranging from 3 to 10 μm and from 20 μm to 80 μm respectively were investigated.

Paper Details

Date Published: 25 July 2013
PDF: 7 pages
Proc. SPIE 8902, Electron Technology Conference 2013, 89021W (25 July 2013); doi: 10.1117/12.2031053
Show Author Affiliations
Magdalena M. Moczała, Wrocław Univ. of Technology (Poland)
Andrzej Sierakowski, Institute of Electron Technology (Poland)
Rafał Dobrowolski, Institute of Electron Technology (Poland)
Piotr Grabiec, Institute of Electron Technology (Poland)
Teodor P. Gotszalk, Wrocław Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 8902:
Electron Technology Conference 2013
Pawel Szczepanski; Ryszard Kisiel; Ryszard S. Romaniuk, Editor(s)

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