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Proceedings Paper

Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation
Author(s): Masahiro Hatakeyama; Takeshi Murakami; Kenji Terao; Kenji Watanabe; Yoshihiko Naito; Tsuyoshi Amano; Ryoichi Hirano; Susumu Iida; Tsuneo Terasawa; Hidehiro Watanabe
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Paper Abstract

In order to realize pattern defect inspection for 1Xnm EUV mask, we are developing a novel projection electron microscopy (PEM) system; which enables us to make the inspection in high resolution and high throughput as compared with conventional DUV and EB inspection systems. To achieve the specification target, e.g., sensitivity of 16nm size in pattern defect and inspection speed of 19 hours/100mm square, we have examined to clear the required progress as compared to the current optical system for PEM; In order to meet the required progress, we made a new design concept and developed a new optical system, which comprises an exposure and an imaging electron optics. In this paper, we describe the evaluation on the basic performance of the developed optical system as concerning to the required progress: 1) transmittances over 10 times on the developed exposure optics and over 2 times on the developed imaging optics; 2) electron imaging being higher energy over 5 times and MTF inclination in hp44~64nm L/S pattern. The results show the developed optical system on the novel PEM is capable to meet the progress for 1Xnm EUV mask inspection.

Paper Details

Date Published: 28 June 2013
PDF: 8 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010S (28 June 2013); doi: 10.1117/12.2030647
Show Author Affiliations
Masahiro Hatakeyama, EBARA Corp. (Japan)
Takeshi Murakami, EBARA Corp. (Japan)
Kenji Terao, EBARA Corp. (Japan)
Kenji Watanabe, EBARA Corp. (Japan)
Yoshihiko Naito, EBARA Corp. (Japan)
Tsuyoshi Amano, EUVL Infrastructure Development Ctr., Inc. (Japan)
Ryoichi Hirano, EUVL Infrastructure Development Ctr., Inc. (Japan)
Susumu Iida, EUVL Infrastructure Development Ctr., Inc. (Japan)
Tsuneo Terasawa, EUVL Infrastructure Development Ctr., Inc. (Japan)
Hidehiro Watanabe, EUVL Infrastructure Development Ctr., Inc. (Japan)


Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

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