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Proceedings Paper

Wide band antireflective coatings Al2O3 / HfO2 / MgF2 for UV region
Author(s): P. Winkowski; Konstanty W. Marszałek
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Paper Abstract

Deposition technology of the three layers antireflective coatings consists of hafnium compound are presented in this paper. Oxide films were deposited by means of e-gun evaporation in vacuum of 5x10-5 mbar in presence of oxygen and fluoride films by thermal evaporation. Substrate temperature was 250°C. Coatings were deposited onto optical lenses made from quartz glass (Corning HPFS). Thickness and deposition rate were controlled by thickness measuring system Inficon XTC/2. Simulations leading to optimization of thickness and experimental results of optical measurements carried during and after deposition process were presented. Physical thickness measurements were made during deposition process and were equal to 43 nm/74 nm/51 nm for Al2O3 / HfO2 / MgF2 respectively. Optimization was carried out for ultraviolet region from 230nm to the beginning of visible region 400 nm. In this region the average reflectance of the antireflective coating was less than 0.5% in the whole range of application.

Paper Details

Date Published: 25 July 2013
PDF: 5 pages
Proc. SPIE 8902, Electron Technology Conference 2013, 890228 (25 July 2013); doi: 10.1117/12.2030511
Show Author Affiliations
P. Winkowski, PEVIN (Poland)
Konstanty W. Marszałek, AGH Univ. of Science and Technology (Poland)


Published in SPIE Proceedings Vol. 8902:
Electron Technology Conference 2013
Pawel Szczepanski; Ryszard Kisiel; Ryszard S. Romaniuk, Editor(s)

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