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Proceedings Paper

Localized planarization of optical damage using laser-based chemical vapor deposition
Author(s): Manyalibo J. Matthews; Selim Elhadj; Gabe M. Guss; Arun Sridharan; Norman D. Nielsen; Jae-Hyuck Yoo; Daeho Lee; Costas Grigoropoulos
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Paper Abstract

We present a method to repair damaged optics using laser-based chemical vapor deposition (L-CVD). A CO2 laser is used to heat damaged silica regions and polymerize a gas precursor to form SiO2. Measured deposition rates and morphologies agree well with finite element modeling of a two-phase reaction. Along with optimizing deposition rates and morphology, we also show that the deposited silica is structurally identical to high-grade silica substrate and possesses high UV laser damage thresholds. Successful application of such a method could reduce processing costs, extend optic lifetime, and lead to more damage resistant laser optics used in high power applications.

Paper Details

Date Published: 25 November 2013
PDF: 9 pages
Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 888526 (25 November 2013); doi: 10.1117/12.2030506
Show Author Affiliations
Manyalibo J. Matthews, Lawrence Livermore National Lab. (United States)
Selim Elhadj, Lawrence Livermore National Lab. (United States)
Gabe M. Guss, Lawrence Livermore National Lab. (United States)
Arun Sridharan, Lawrence Livermore National Lab. (United States)
Norman D. Nielsen, Lawrence Livermore National Lab. (United States)
Jae-Hyuck Yoo, Univ. of California, Berkeley (United States)
Daeho Lee, Univ. of California, Berkeley (United States)
Costas Grigoropoulos, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 8885:
Laser-Induced Damage in Optical Materials: 2013
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau, Editor(s)

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