Share Email Print

Proceedings Paper

Effective aluminum oxide thin films deposition using reactive pulsed magnetron sputtering: possibilities and limitations
Author(s): Maciej Gruszka; Witold Posadowski; Zuzanna Sidor; Anna Piotrowska; Artur Wiatrowski
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Thin film chemical compounds can be obtained as a result of sputtering of dielectric target (High-Frequency sputtering) or sputtering of conductive target in reactive atmosphere (Direct Current or pulsed sputtering). Achievement of high efficiency of thin films deposition is possible when conductive target is sputtered, as its surface is not covered (or is covered only partially) with dielectric compound. Aim of this work was obtaining aluminum oxide thin films with highest efficiency, using reactive pulsed magnetron sputtering of aluminum target in Ar+O2 atmosphere.

Paper Details

Date Published: 25 July 2013
PDF: 7 pages
Proc. SPIE 8902, Electron Technology Conference 2013, 89020A (25 July 2013); doi: 10.1117/12.2030272
Show Author Affiliations
Maciej Gruszka, Wrocław Univ. of Technology (Poland)
Witold Posadowski, Wrocław Univ. of Technology (Poland)
Zuzanna Sidor, Institute of Electron Technology (Poland)
Anna Piotrowska, Institute of Electron Technology (Poland)
Artur Wiatrowski, Wrocław Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 8902:
Electron Technology Conference 2013
Pawel Szczepanski; Ryszard Kisiel; Ryszard S. Romaniuk, Editor(s)

© SPIE. Terms of Use
Back to Top