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Proceedings Paper

Scanner grid recipe creation improvement for tighter overlay specifications
Author(s): Eric Cotte; Hariharasudhan Kathiresan; Matthias Ruhm; Bernd Schulz; Uwe Schulze
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Paper Abstract

Overlay specifications are tightening with each lithography technology node. As a result, there is a need to improve overlay control methodologies to make them more robust and less time- or effort-consuming, but without any compromise in quality. Two concepts aimed at improving the creation of scanner grid recipes in order to meet evertightening overlay specifications are proposed in this article. Simulations will prove that these concepts can achieve both goals, namely improving overlay control performance and reducing the time and effort required to do so. While more studies are needed to fine-tune the parameters to employ, the trends presented in this paper clearly show the benefits.

Paper Details

Date Published: 1 October 2013
PDF: 10 pages
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 888608 (1 October 2013); doi: 10.1117/12.2030186
Show Author Affiliations
Eric Cotte, GLOBALFOUNDRIES (Germany)
Hariharasudhan Kathiresan, GLOBALFOUNDRIES (Germany)
Matthias Ruhm, GLOBALFOUNDRIES (Germany)
Bernd Schulz, GLOBALFOUNDRIES (Germany)
Uwe Schulze, GLOBALFOUNDRIES (Germany)

Published in SPIE Proceedings Vol. 8886:
29th European Mask and Lithography Conference
Uwe F. W. Behringer; Wilhelm Maurer, Editor(s)

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