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Proceedings Paper

Development of high resistant anti-reflection coating by using Al2O3/SiO2 multilayer
Author(s): Yoshihiro Ochi; Keisuke Nagashima; Hajime Okada; Momoko Tanaka; Ryo Tateno; Yasuyuki Furukawa; Akira Sugiyama
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Paper Abstract

We developed high-resistant anti-reflection (AR) coating by using Al2O3/SiO2 multilayer for Yb:YAG thin disk amplifier. The AR coating was designed both for 940 nm of pump laser at an incident angle of 30 degrees and for 1030 nm of seed laser at 5 degrees. The Al2O3/SiO2 multilayer was deposited by using the electron beam evaporation technique on a fused silica substrate and then the laser induced damage threshold was evaluated. The sample was irradiated by 1030 nm laser with 520 ps duration delivered from the Yb:YAG thin-disk regenerative amplifier. The measured damage threshold of the Al2O3/SiO2 AR coating was 75 J/cm2.

Paper Details

Date Published: 14 November 2013
PDF: 6 pages
Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 88851Z (14 November 2013); doi: 10.1117/12.2030096
Show Author Affiliations
Yoshihiro Ochi, Japan Atomic Energy Agency (Japan)
Keisuke Nagashima, Japan Atomic Energy Agency (Japan)
Hajime Okada, Japan Atomic Energy Agency (Japan)
Momoko Tanaka, Japan Atomic Energy Agency (Japan)
Ryo Tateno, Shimadzu Corp. (Japan)
Yasuyuki Furukawa, Shimadzu Corp. (Japan)
Akira Sugiyama, Japan Atomic Energy Agency (Japan)

Published in SPIE Proceedings Vol. 8885:
Laser-Induced Damage in Optical Materials: 2013
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau, Editor(s)

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