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Proceedings Paper

Modeling of resist surface charging effect on EBM-8000 and its comparison with EBM-6000
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Paper Abstract

In this paper, we report our modeling results of the resist surface charging effect on our newer e-beam mask writer EBM-8000. We show that our fundamental modeling scheme we have developed for EBM-6000 can be adapted on EBM-8000 platform without major modifications. We also discuss the significant differences in the charging effect between EBM-6000 and EBM-8000 in terms of its amplitude, its spatial distribution, and its dependency on the pattern density.

Paper Details

Date Published: 28 June 2013
PDF: 8 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 870102 (28 June 2013); doi: 10.1117/12.2030095
Show Author Affiliations
Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
Takashi Kamikubo, NuFlare Technology, Inc. (Japan)
Hirohito Anze, NuFlare Technology, Inc. (Japan)
Munehiro Ogasawara, NuFlare Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

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