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Proceedings Paper

Development of the CLIOS G821 system for inspection of LSPM for high-definition FPDs
Author(s): Makoto Takano; Mitsuru Hamakawa; Masahiro Toriguchi; Shinya Kuroda; Atsushi Tajima
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Paper Abstract

Lasertec has developed CLIOS G821, a new inspection system designed to inspect finely-patterned large-size photomasks used for production of high-definition FPDs. CLIOS G821 is a highly advanced successor to 51MD, which has been acclaimed as a de facto industry standard of inspection tools for the 8th generation large-size photomasks. Photomasks are becoming more and more finely patterned due to the high demand for higher quality displays driven by strong sales in smartphones as well as the introduction of the latest 4K2K HDTV format. They are also becoming more complex and advanced by the use of half-toned masks and grey-toned masks. At the frontline of production, there is a strong need for a high-sensitivity inspection tool that is capable of detecting defects on the finely-patterned and highly-advanced photomasks. In order to meet such a need, Lasertec has redesigned optics, stage mechanism and detection circuit for CLIOS G821, offering high-sensitivity and high-throughput inspection for finely-patterned and highly-advanced photomasks. The presentation will describe the superior performance and functions of CLIOS G821 in comparison to our previous model, 51MD.

Paper Details

Date Published: 28 June 2013
PDF: 12 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010J (28 June 2013); doi: 10.1117/12.2029106
Show Author Affiliations
Makoto Takano, Lasertec Corp. (Japan)
Mitsuru Hamakawa, Lasertec Corp. (Japan)
Masahiro Toriguchi, Lasertec Corp. (Japan)
Shinya Kuroda, Lasertec Corp. (Japan)
Atsushi Tajima, Lasertec Corp. (Japan)


Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

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