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Proceedings Paper

A study of applications scribe frame data verifications using design rule check
Author(s): Shoko Saito; Masaru Miyazaki; Mitsuo Sakurai; Takahisa Itoh; Kazumasa Doi; Norioko Sakurai; Tomoyuki Okada
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Paper Abstract

In semiconductor manufacturing, scribe frame data generally is generated for each LSI product according to its specific process design. Scribe frame data is designed based on definition tables of scanner alignment, wafer inspection and customers specified marks. We check that scribe frame design is conforming to specification of alignment and inspection marks at the end. Recently, in COT (customer owned tooling) business or new technology development, there is no effective verification method for the scribe frame data, and we take a lot of time to work on verification. Therefore, we tried to establish new verification method of scribe frame data by applying pattern matching and DRC (Design Rule Check) which is used in device verification. We would like to show scheme of the scribe frame data verification using DRC which we tried to apply. First, verification rules are created based on specifications of scanner, inspection and others, and a mark library is also created for pattern matching. Next, DRC verification is performed to scribe frame data. Then the DRC verification includes pattern matching using mark library. As a result, our experiments demonstrated that by use of pattern matching and DRC verification our new method can yield speed improvements of more than 12 percent compared to the conventional mark checks by visual inspection and the inspection time can be reduced to less than 5 percent if multi-CPU processing is used. Our method delivers both short processing time and excellent accuracy when checking many marks. It is easy to maintain and provides an easy way for COT customers to use original marks. We believe that our new DRC verification method for scribe frame data is indispensable and mutually beneficial.

Paper Details

Date Published: 28 June 2013
PDF: 6 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010P (28 June 2013); doi: 10.1117/12.2028330
Show Author Affiliations
Shoko Saito, Fujitsu Semiconductor Ltd. (Japan)
Masaru Miyazaki, Fujitsu Semiconductor Ltd. (Japan)
Mitsuo Sakurai, Fujitsu Semiconductor Ltd. (Japan)
Takahisa Itoh, Fujitsu Semiconductor Ltd. (Japan)
Kazumasa Doi, Fujitsu Semiconductor Ltd. (Japan)
Norioko Sakurai, Fujitsu Semiconductor Ltd. (Japan)
Tomoyuki Okada, Fujitsu Semiconductor Ltd. (Japan)

Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

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