Share Email Print

Proceedings Paper

Quality enhancement of parallel MDP flows with mask suppliers
Author(s): Erwin Deng; Rachel Lee; Chun Der Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

For many maskshops, designed parallel mask data preparation (MDP) flows accompanying with a final data comparison are viewed as a reliable method that could reduce quality risks caused by mis-operation. However, in recent years, more and more mask data mistakes have shown that present parallel MDP flows could not capture all mask data errors yet. In this paper, we will show major failure models of parallel MDP flows from analyzing MDP quality accidents and share our approaches to achieve further improvement with mask suppliers together.

Paper Details

Date Published: 28 June 2013
PDF: 6 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010L (28 June 2013); doi: 10.1117/12.2028297
Show Author Affiliations
Erwin Deng, United Microelectronics Corp. (Taiwan)
Rachel Lee, United Microelectronics Corp. (Taiwan)
Chun Der Lee, United Microelectronics Corp. (Taiwan)

Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

© SPIE. Terms of Use
Back to Top