Share Email Print
cover

Proceedings Paper

In collaboration with mask suppliers for change management enhancement
Author(s): Erwin Deng; Chun Der Lee; Rachel Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

For those wafer fabs that have no their own maskshops, the main target of mask quality department is to gain stable mask quality performance through effective supplier management, and therefore achieves competitive business results. After dealing with lots of mask data preparation (MDP) quality problems with suppliers, we have found that incomplete change management procedures are one of major sources that induce incorrect mask data for writing. This article will share our experience in how to enhance change management flows with mask suppliers together and will also show the utility after a series of flow improvement actions.

Paper Details

Date Published: 28 June 2013
PDF: 5 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010K (28 June 2013); doi: 10.1117/12.2028296
Show Author Affiliations
Erwin Deng, United Microelectronics Corp. (Taiwan)
Chun Der Lee, United Microelectronics Corp. (Taiwan)
Rachel Lee, United Microelectronics Corp. (Taiwan)


Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

© SPIE. Terms of Use
Back to Top