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Proceedings Paper

High resolution technology for FPD lithography tools
Author(s): Nobuhiko Yabu; Yoshiyuki Nagai; Satoshi Tomura; Tomohiro Yoshikawa
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Paper Abstract

As the resolution of LCD panels adapted for Smartphone and Tablet PC rapidly becomes higher, the performance needed for lithography tools to produce them also becomes higher than ever. To respond to such needs, we have developed new lithography tools for mass production of high resolution LCD panels. We have executed various exposure tests to evaluate their performance. In this paper, we present the results of these tests. By employing higher NA projection optics, high resolution (2.0μm and under) has been achieved. We also present the effect of special illumination and the difference in profile between kinds of photoresist. Furthermore, we also refer what will be needed for masks and blanks in the next generation. To achieve even higher resolution, it is necessary for masks and blanks to have high flatness, low level of defects and small linewidth error.

Paper Details

Date Published: 28 June 2013
PDF: 8 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010I (28 June 2013); doi: 10.1117/12.2028215
Show Author Affiliations
Nobuhiko Yabu, Canon Inc. (Japan)
Yoshiyuki Nagai, Canon Inc. (Japan)
Satoshi Tomura, Canon Inc. (Japan)
Tomohiro Yoshikawa, Canon Inc. (Japan)


Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

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