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Proceedings Paper

Performance of an automatic algorithm for quantifying critical dimensions in actinic aerial images
Author(s): Doug Uzzel; Mark Ma; Shad E. Hedges; Saghir Munir
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Paper Abstract

This article presents results from an algorithm that can automatically quantify critical dimensions in images from Mask inspection tools with a very high level of accuracy. Using such an algorithm the inspection systems can be run with much tighter settings, resulting in more false defect detections that can then be filtered using the algorithm described here. Such a technique could potentially make the inspection system suitable for inspecting photo-masks beyond its practical limitation.

Paper Details

Date Published: 9 September 2013
PDF: 10 pages
Proc. SPIE 8880, Photomask Technology 2013, 88800B (9 September 2013); doi: 10.1117/12.2027913
Show Author Affiliations
Doug Uzzel, Photronics Inc. (United States)
Mark Ma, Photronics Inc. (United States)
Shad E. Hedges, Photronics Inc. (United States)
Saghir Munir, Reticle Labs, LLC (United States)


Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)

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