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Proceedings Paper

Projection exposure using a projector with highly minute liquid crystal display panels
Author(s): Soichiro Koyama; Kenji Saito; Toshiyuki Horiuchi
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Paper Abstract

Projection lithography using a liquid crystal display panel in place of a reticle is expected as a low-cost reticleless patterning method. Here, a simple but useful new exposure system using a projector with highly minute liquid crystal display panels is proposed. A projector with a light source and red, green and blue liquid crystal display panels was used as it was, and a set of two commercial macro-lenses was attached as reduction projection optics. The exposure system was evaluated by printing various patterns. Positive OFPR-800 (Tokyo Ohka Kogyo) was used as a resist. The diameter of the exposure field was approximately 6 mm. As a result, line patterns with a minimum width of 14 μm were clearly resolved. However, noticeable partial exposure unevenness was observed for patterns with a width of 40 μm or less. Because applications using large patterns with widths of 100-200 μm are aimed at hand, it is not a problem, and patterns with such large sizes are sharply and homogeneously printed even if they are considerably complicated.

Paper Details

Date Published: 28 June 2013
PDF: 6 pages
Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010U (28 June 2013); doi: 10.1117/12.2027570
Show Author Affiliations
Soichiro Koyama, Tokyo Denki Univ. (Japan)
Kenji Saito, Tokyo Denki Univ. (Japan)
Toshiyuki Horiuchi, Tokyo Denki Univ. (Japan)

Published in SPIE Proceedings Vol. 8701:
Photomask and Next-Generation Lithography Mask Technology XX
Kokoro Kato, Editor(s)

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