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Proceedings Paper

Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties
Author(s): Bryan M. Barnes; Jing Qin; Hui Zhou; Richard M. Silver
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Paper Abstract

Recently, a new technique called Fourier normalization has enabled the parametric fitting of optical images with multiple or even a continuum of scattered spatial frequencies. Integral to the performance of this methodology is the characterization of the high magnification imaging microscope used in these experiments. Scatterfield microscopy techniques yield the necessary angular resolution required for determining the effects of the illumination and collection paths upon the electric field within the microscope. A multi-step characterization methodology is presented with experimental examples using a microscope operating at λ = 450 nm. A prior scatterfield characterization technique for specular reflectors is reviewed and shown to be a special case of the newer generalized approach. Possible implications of this methodology for improved critical dimension measurements are assessed.

Paper Details

Date Published: 23 September 2013
PDF: 7 pages
Proc. SPIE 8819, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII, 88190E (23 September 2013); doi: 10.1117/12.2027259
Show Author Affiliations
Bryan M. Barnes, National Institute of Standards and Technology (United States)
Jing Qin, National Institute of Standards and Technology (United States)
Hui Zhou, National Institute of Standards and Technology (United States)
Richard M. Silver, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 8819:
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
Michael T. Postek; Ndubuisi George Orji, Editor(s)

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