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Proceedings Paper

Interference pattern processing technique for optical phase measurement with applications in precision surface metrology
Author(s): W. Tischer
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Paper Abstract

A signal processing method is proposed for optical nhase measurement from spatial carrier frequency interference fringe pattern. The intensity model of the interference pattern is adapted to the measured intensity array of the interferogram using a parameter-adaptive estimation algorithm to identify the model parameters. The algorithm is implemented in a digital interferogram analysing system for applications in precision surface microprofilometry and roughness measurements. 1.

Paper Details

Date Published: 1 August 1990
PDF: 9 pages
Proc. SPIE 1266, In-Process Optical Measurements and Industrial Methods, (1 August 1990); doi: 10.1117/12.20269
Show Author Affiliations
W. Tischer, Institute of Automation (Germany)

Published in SPIE Proceedings Vol. 1266:
In-Process Optical Measurements and Industrial Methods
H. A. Macleod; Peter Langenbeck, Editor(s)

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