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Proceedings Paper

Noninvasive measurement of ion currents in plasma-assisted processes using an optical fiber Faraday ring ammeter
Author(s): Karl H. Guenther; Indu F. Saxena; Roy B. Torbert
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Paper Abstract

The efficiency of plasma assisted deposition processes such as reactive ion plating with regard to the densification of the deposited thin films depends strongly on the arrival rate ratio of ionized species (atoms molecules) to the total influx of vaporized coating material. While it is relatively easy to measure ion beam currents produced by an auxiliary ion beam source (for example a Kaufman gun) it is much more difficult to measure ion currents in plasma processes. Typical probe measurements change the plasma conditions almost instantaneously. An optical fiber Faraday ring ammeter initially developed for space plasma research provides for a non-invasive measurement of ion currents present in plasma assisted deposition processes. We will be discussing the principles and the potential use of such a device in a high vacuum box coater equipped for low voltage reactive ion plating deposition. 1.

Paper Details

Date Published: 1 August 1990
PDF: 5 pages
Proc. SPIE 1266, In-Process Optical Measurements and Industrial Methods, (1 August 1990); doi: 10.1117/12.20266
Show Author Affiliations
Karl H. Guenther, CREOL/Univ. of Central Florida (United States)
Indu F. Saxena, Univ. of Alabama in Huntsville (United States)
Roy B. Torbert, Univ. of Alabama in Huntsville (United States)


Published in SPIE Proceedings Vol. 1266:
In-Process Optical Measurements and Industrial Methods
H. A. Macleod; Peter Langenbeck, Editor(s)

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