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Proceedings Paper

The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope
Author(s): Kenneth A. Goldberg; Iacopo Mochi; Markus P. Benk; Chihcheng Lin; Arnaud P. Allezy; Michael Dickinson; Carl W. Cork; James B. Macdougall; Erik H. Anderson; Weilun Chao; Farhad Salmassi; Eric M. Gullikson; Daniel Zehm; Vamsi Vytla; William Cork; Jason DePonte; Gino Picchi; Ahmet Pekedis; Takeshi Katayanagi; Michael S Jones; Elizabeth Martin; Patrick P Naulleau; Senajith B Rekawa
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Paper Abstract

The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a newly commissioned, synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research. SHARP offers several major advances including objective lenses with 4xNA values from 0.25 to 0.625, flexible, lossless coherence control through a Fourier-synthesis illuminator, a rotating azimuthal plane of incidence up to ±25°, illumination central ray angles from 6 to 10°, and a continuously tunable, EUV illumination wavelength. SHARP is now being used to study programmed and native mask defects, defect repairs, mask architecture, optical proximity correction, and the influence of mask substrate roughness on imaging. SHARP has the ability to emulate a variety of current and future lithography tool numerical apertures, and illumination properties. Here, we present various performance studies and examples where SHARP’s unique capabilities are used in EUV mask research.

Paper Details

Date Published: 20 September 2013
PDF: 9 pages
Proc. SPIE 8880, Photomask Technology 2013, 88800T (20 September 2013); doi: 10.1117/12.2026496
Show Author Affiliations
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Iacopo Mochi, Lawrence Berkeley National Lab. (United States)
Markus P. Benk, Lawrence Berkeley National Lab. (United States)
Chihcheng Lin, SEMATECH Inc. (United States)
Arnaud P. Allezy, Lawrence Berkeley National Lab. (United States)
Michael Dickinson, Lawrence Berkeley National Lab. (United States)
Carl W. Cork, Lawrence Berkeley National Lab. (United States)
James B. Macdougall, Lawrence Berkeley National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Farhad Salmassi, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Daniel Zehm, Lawrence Berkeley National Lab. (United States)
Vamsi Vytla, Lawrence Berkeley National Lab. (United States)
William Cork, Lawrence Berkeley National Lab. (United States)
Jason DePonte, Lawrence Berkeley National Lab. (United States)
Gino Picchi, Lawrence Berkeley National Lab. (United States)
Ahmet Pekedis, Lawrence Berkeley National Lab. (United States)
Takeshi Katayanagi, Lawrence Berkeley National Lab. (United States)
Michael S Jones, Lawrence Berkeley National Lab. (United States)
Elizabeth Martin, Lawrence Berkeley National Lab. (United States)
Patrick P Naulleau, Lawrence Berkeley National Lab. (United States)
Senajith B Rekawa, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)

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