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Proceedings Paper

Simulation study of multi-beamlet fogging effect on hard mask
Author(s): Hyuncheong Ha; Sanghee Lee; Inkyun Shin; Shuichi Tamamushi; Chan-Uk Jeon
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Paper Details

Date Published:
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Proc. SPIE 8880, Photomask Technology 2013, 888009; doi: 10.1117/12.2026199
Show Author Affiliations
Hyuncheong Ha, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sanghee Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Inkyun Shin, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Shuichi Tamamushi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan-Uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)

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