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Proceedings Paper

Design optimization of ultra-precise elliptical mirrors for hard x-ray nanofocusing at Nanoscopium
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Paper Abstract

The design and implementation of a pair of 100 mm-long grazing-incidence total-reflection mirrors for the hard X-ray beamline Nanoscopium at Synchrotron Soleil is presented. A vertically and horizontally nanofocusing mirror pair, oriented in Kirkpatrick-Baez geometry, has been designed and fabricated with the aim of creating a diffraction-limited high-intensity 5 − 20 keV beam with a focal spot size as small as 50 nm. We describe the design considerations, including wave-optical calculations of figures-of-merit that are relevant for spectromicroscopy, such as the focal spot size, depth of field and integrated intensity. The mechanical positioning tolerance in the pitch angle that is required to avoid introducing high-intensity features in the neighborhood of the focal spot is demonstrated with simulations to be of the order of microradians, becoming tighter for shorter focal lengths and therefore directly affecting all nanoprobe mirror systems. Metrology results for the completed mirrors are presented, showing that better than 1.5 °A-rms figure error has been achieved over the full mirror lengths with respect to the designed elliptical surfaces, with less than 60 nrad-rms slope errors.

Paper Details

Date Published: 26 September 2013
PDF: 10 pages
Proc. SPIE 8851, X-Ray Nanoimaging: Instruments and Methods, 88510G (26 September 2013); doi: 10.1117/12.2026026
Show Author Affiliations
Cameron M. Kewish, Synchrotron SOLEIL (France)
François Polack, Synchrotron SOLEIL (France)
Riccardo Signorato, Bruker ASC GmbH (Germany)
Andrea Somogyi, Synchrotron SOLEIL (France)

Published in SPIE Proceedings Vol. 8851:
X-Ray Nanoimaging: Instruments and Methods
Barry Lai, Editor(s)

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