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Proceedings Paper

DSA template mask determination and cut redistribution for advanced 1D gridded design
Author(s): Zigang Xiao; Yuelin Du; Martin D.F. Wong; Hongbo Zhang
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Paper Abstract

Directed self-assembly (DSA) technology has already demonstrated its capability for isolated and grouped contact/via pattern for 1D gridded design. If we reverse the resist tune, this technique can also be used to implement the cut printing. However, for this purpose, we need to redistribe the cuts by extending the real wires to form the desired cut distribution for template mask making. Based on this assumption, we propose an algorithm to redistribute the original cuts such that they form groups of non-conflict DSA templates. Experimental results demonstrate that our method can effectively redistribute the cuts and improve the layout manufacturability.

Paper Details

Date Published: 9 September 2013
PDF: 8 pages
Proc. SPIE 8880, Photomask Technology 2013, 888017 (9 September 2013); doi: 10.1117/12.2025688
Show Author Affiliations
Zigang Xiao, Univ. of Illinois at Urbana-Champaign (United States)
Yuelin Du, Univ. of Illinois at Urbana-Champaign (United States)
Martin D.F. Wong, Univ. of Illinois at Urbana-Champaign (United States)
Hongbo Zhang, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)

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