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Proceedings Paper

OPC modeling using AFM CD measurement
Author(s): Kyoil Koo; Gyengseop Kim; Sanghun Kim; Seunghune Yang; Sooryong Lee; Youngchang Kim; Jungdal Choi; Hokyu Kang
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Paper Abstract

Most important factors in OPC model building will be sampling data for model calibration. We will demonstrate that how CD-AFM data can be used in OPC modeling and will show possibility to get a more predictive model by using CD-AFM data.

Paper Details

Date Published: 9 September 2013
PDF: 10 pages
Proc. SPIE 8880, Photomask Technology 2013, 88801Q (9 September 2013); doi: 10.1117/12.2025552
Show Author Affiliations
Kyoil Koo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Gyengseop Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sanghun Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seunghune Yang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sooryong Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Youngchang Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jungdal Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hokyu Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8880:
Photomask Technology 2013
Thomas B. Faure; Paul W. Ackmann, Editor(s)

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