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Proceedings Paper

Optimization of baffle configuration for stray light reduction
Author(s): M. Pancrazzi; S. Vivès; F. Landini; C. Guillon; C. Escolle; J. Garcia
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Paper Abstract

Reducing the stray light level is one of the issues that astronomical instruments have to face. In particular, the design of baffles requires special attention in order to minimize the light scattered and diffracted by the edge of the baffle's vanes. The choice of the materials and the treatments used to manufacturing those parts can significantly increase the performance of stray light suppression. This is particularly critical for instruments in which the main source of stray light is in the field-of-view and its brightness is much higher than the signal the experiment aims to measure, such as solar and stellar coronagraphs. In order to identify the best configuration to adopt in the design and manufacture of a future coronagraph, we designed a dedicated set-up that allows comparing different edge geometries and finishing in a fast and comprehensive approach. A reference edge configuration was chosen and all the other configurations were compared with it. In this paper, we describe the set-up, the characterized configurations and the obtained results.

Paper Details

Date Published: 26 September 2013
PDF: 10 pages
Proc. SPIE 8862, Solar Physics and Space Weather Instrumentation V, 886205 (26 September 2013); doi: 10.1117/12.2025336
Show Author Affiliations
M. Pancrazzi, Lab. d'Astrophysique de Marseille, CNRS, Aix Marseille Univ. (France)
Univ. degli Studi di Firenze (Italy)
S. Vivès, Lab. d'Astrophysique de Marseille, CNRS, Aix Marseille Univ. (France)
F. Landini, Univ. degli Studi di Firenze (Italy)
C. Guillon, Lab. d'Astrophysique de Marseille, CNRS, Aix Marseille Univ. (France)
C. Escolle, Lab. d'Astrophysique de Marseille, CNRS, Aix Marseille Univ. (France)
J. Garcia, Lab. d'Astrophysique de Marseille, CNRS, Aix Marseille Univ. (France)


Published in SPIE Proceedings Vol. 8862:
Solar Physics and Space Weather Instrumentation V
Silvano Fineschi; Judy Fennelly, Editor(s)

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