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Proceedings Paper

Wide band antireflection coatings deposited by atomic layer deposition
Author(s): April D. Jewell; John Hennessy; Michael E. Hoenk; Shouleh Nikzad
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Paper Abstract

Here we describe the development of optical coatings for silicon-based detectors for astronomy, planetary and terrestrial applications. We have used atomic layer deposition (ALD) to develop broadband (i.e. 320-1000 nm) antireflection (AR) coatings on silicon substrates with the ultimate goal of incorporating these AR coatings with existing detector technologies. Materials characterization was used to study film and interface quality of these coatings. We are able to achieve precision growth of single and multilayer films to significantly reduce reflection losses for this region of spectrum and provide tailored, repeatable performance targeted for specific applications.

Paper Details

Date Published: 25 September 2013
PDF: 9 pages
Proc. SPIE 8820, Nanoepitaxy: Materials and Devices V, 88200Z (25 September 2013); doi: 10.1117/12.2025198
Show Author Affiliations
April D. Jewell, Jet Propulsion Lab. (United States)
John Hennessy, Jet Propulsion Lab. (United States)
Michael E. Hoenk, Jet Propulsion Lab. (United States)
Shouleh Nikzad, Jet Propulsion Lab. (United States)

Published in SPIE Proceedings Vol. 8820:
Nanoepitaxy: Materials and Devices V
Nobuhiko P. Kobayashi; A. Alec Talin; Albert V. Davydov; M. Saif Islam, Editor(s)

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