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Proceedings Paper

Process-induced inhomogeneities in higher asymmetry angle x-ray monochromators
Author(s): D. Korytár; P. Vagovič; C. Ferrari; P. Šiffalovič; M. Jergel; E. Dobročka; Z. Zápražný; V. Áč; P. Mikulík
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Paper Abstract

Beam inhomogeneities of asymmetric Ge(220)-based V-shaped and single bounce monochromators have been studied both in metrological and imaging applications for photon energies around 8 keV. Presence of growth striations in graded GeSi, grains in single Cu crystal, and strains in thermally tuned V-channel monochromators observed in X-ray topographs excludes these materials from imaging applications. As for stochastic surface processing, chemomechanical polishing (CMP) produces better surface homogeneity than chemical polish. However, CMP is more difficult to be applied in V-channels, where chemical polishing is prefered. For comparison, measurements on surfaces processed by a deterministic mechanical method of single point diamond turning (SPDT) have shown SPDT to be a perspective technology. Again, to prepare deep grooves with this technique is also a challenge, mainly for tool makers. Some process induced features are observed as wavefield distortions in interference fringes.

Paper Details

Date Published: 27 September 2013
PDF: 8 pages
Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 88480U (27 September 2013); doi: 10.1117/12.2025142
Show Author Affiliations
D. Korytár, Institute of Electrical Engineering (Slovakia)
P. Vagovič, Tohoku Univ. (Japan)
C. Ferrari, CNR, Istituto Materiali per Elettronica e Magnetismo (Italy)
P. Šiffalovič, Institute of Physics (Slovakia)
M. Jergel, Institute of Physics (Slovakia)
E. Dobročka, Institute of Electrical Engineering (Slovakia)
Z. Zápražný, Institute of Electrical Engineering (Slovakia)
V. Áč, Alexander Dubček Univ. of Trenčín (Slovakia)
P. Mikulík, Masaryk Univ. (Czech Republic)


Published in SPIE Proceedings Vol. 8848:
Advances in X-Ray/EUV Optics and Components VIII
Ali Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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