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Proceedings Paper

Aberration-free silicon pore x-ray optics
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Paper Abstract

Silicon Pore Optics is an enabling technology for future L- and M-class astrophysics X-ray missions, which require high angular resolution (~5 arc seconds) and large effective area (1 to 2 m2 at a few keV). The technology exploits the high-quality of super-polished 300 mm silicon wafers and the associated industrial mass production processes, which are readily available in the semiconductor industry. The plan-parallel wafers have a surface roughness better than 0.1 nm rms and are diced, structured, wedged, coated, bent and stacked to form modular Silicon Pore Optics, which can be grouped into a larger optic. The modules are assembled from silicon alone, with all the mechanical advantages, and form an intrinsically stiff pore structure.

The optics design was initially based on long (25 to 50 m) focal length X-ray telescopes, which could achieve several arc second angular resolution by curving the silicon mirror in only one direction (conical approximation).

Recently shorter focal length missions (10 to 20 m) have been discussed, for which we started to develop Silicon Pore Optics having a secondary curvature in the mirror, allowing the production of Wolter-I type optics, which are on axis aberration-free.

In this paper we will present the new manufacturing process, the results achieved and the lessons learned.


Paper Details

Date Published: 26 September 2013
PDF: 11 pages
Proc. SPIE 8861, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VI, 88610M (26 September 2013); doi: 10.1117/12.2024982
Show Author Affiliations
Maximilien J. Collon, cosine Research B.V. (Netherlands)
Marcelo Ackermann, cosine Research B.V. (Netherlands)
Ramses Günther, cosine Research B.V. (Netherlands)
Giuseppe Vacanti, cosine Science and Computing B.V. (Netherlands)
Marco W. Beijersbergen, cosine Research B.V. (Netherlands)
Marcos Bavdaz, European Space Agency, ESTEC (Netherlands)
Eric Wille, European Space Agency, ESTEC (Netherlands)
Kotska Wallace, European Space Agency, ESTEC (Netherlands)
Jeroen Haneveld, Micronit Microfluidics B.V. (Netherlands)
Mark Olde Riekerink, Micronit Microfluidics B.V. (Netherlands)
Arenda Koelewijn, Micronit Microfluidics B.V. (Netherlands)
Coen van Baren, SRON Netherlands Institute for Space Research (Netherlands)
Peter Müller, Physikalisch-Technische Bundesanstalt (Germany)
Michael Krumrey, Physikalisch-Technische Bundesanstalt (Germany)
Vadim Burwitz, Max-Planck-Institut für extraterrestrische Physik (Germany)
Giorgia Sironi, INAF - Osservatorio Astronomico di Brera (Italy)
Mauro Ghigo, INAF - Osservatorio Astronomico di Brera (Italy)


Published in SPIE Proceedings Vol. 8861:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy VI
Stephen L. O'Dell; Giovanni Pareschi, Editor(s)

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