Share Email Print
cover

Proceedings Paper

High contrast internal and external coronagraph masks produced by various techniques
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

High contrast internal and external coronagraphic imaging requires a variety of masks depending on different architectures to suppress star light. Various fabrication technologies are required to address a wide range of needs including gradient amplitude transmission, tunable phase profiles, ultra-low reflectivity, precise small scale features, and low-chromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks, and lab-scale external occulter type masks by various techniques including electron beam, ion beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each. Further development is in progress to produce circular masks of various kinds for obscured aperture telescopes.

Paper Details

Date Published: 26 September 2013
PDF: 9 pages
Proc. SPIE 8864, Techniques and Instrumentation for Detection of Exoplanets VI, 88641R (26 September 2013); doi: 10.1117/12.2024615
Show Author Affiliations
Kunjithapatham Balasubramanian, Jet Propulsion Lab. (United States)
Daniel Wilson, Jet Propulsion Lab. (United States)
Victor White, Jet Propulsion Lab. (United States)
Richard Muller, Jet Propulsion Lab. (United States)
Matthew Dickie, Jet Propulsion Lab. (United States)
Karl Yee, Jet Propulsion Lab. (United States)
Ronald Ruiz, Jet Propulsion Lab. (United States)
Stuart Shaklan, Jet Propulsion Lab. (United States)
Eric Cady, Jet Propulsion Lab. (United States)
Brian Kern, Jet Propulsion Lab. (United States)
Ruslan Belikov, NASA Ames Research Ctr. (United States)
Olivier Guyon, The Univ. of Arizona (United States)
N. Jeremy Kasdin, Princeton Univ. (United States)


Published in SPIE Proceedings Vol. 8864:
Techniques and Instrumentation for Detection of Exoplanets VI
Stuart Shaklan, Editor(s)

© SPIE. Terms of Use
Back to Top