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Proceedings Paper

Fabrication of x-ray gratings by direct write maskless lithography
Author(s): D. L. Voronov; S. Diez; P. Lum; S. A. Hidalgo; T. Warwick; N. Artemiev; H. A. Padmore
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Paper Abstract

Fabrication of diffraction grating for x-rays is a very challenging problem due to the exacting requirements of surface quality, groove position, and groove profile. Traditional fabrication techniques have significant limitations and do not cover all the necessary requirements. For example, classical holographic recording is limited in the type of groove patterns that can be produced. This is particularly important in the design of wide aperture high resolution spectrometers, where aberration correction using complex groove patterns is necessary. We are pioneering the use of direct-write mask-less optical lithography to make grating patterns of arbitrary complexity. In this work we report on the first results from our direct-write mask-less approach, including quality assessment of the patterns using interferometric techniques.

Paper Details

Date Published: 27 September 2013
PDF: 11 pages
Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 88480Q (27 September 2013); doi: 10.1117/12.2024489
Show Author Affiliations
D. L. Voronov, Lawrence Berkeley National Lab. (United States)
S. Diez, Heidelberg Instruments GmbH (Germany)
P. Lum, Univ. of California, Berkeley (United States)
S. A. Hidalgo, Lawrence Berkeley National Lab. (United States)
T. Warwick, Lawrence Berkeley National Lab. (United States)
N. Artemiev, Lawrence Berkeley National Lab. (United States)
H. A. Padmore, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 8848:
Advances in X-Ray/EUV Optics and Components VIII
Ali Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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