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Proceedings Paper

High precision surface metrology of x-ray optics with an interferometric microscope
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Paper Abstract

We describe a systematic procedure developed for surface characterization of super polished x-ray optical components with an interferometric microscope. In this case, obtaining trustworthy metrology data requires thorough accounting of the instrument’s optical aberrations, its spatial resolution, and random noise. We analyze and cross compare two general experimental approaches to eliminate the aberration contribution. The reference surface approach relies on aberration evaluation with successive measurements of a high quality reference mirror. The so called super smooth measurement mode consists of subtracting two surface profiles measured over two statistically uncorrelated areas of the optics under test. The precisely measured instrument’s modulation transfer function (MTF) and random noise spectrum allows us to correct the aberration-amended surface topography in the spatial frequency domain. While the developed measurement procedure is general and can be applied to various metrology instruments, the specific results presented are from a Zygo NewView™ 7300 microscope.

Paper Details

Date Published: 23 September 2013
PDF: 8 pages
Proc. SPIE 8838, Optical Manufacturing and Testing X, 883808 (23 September 2013); doi: 10.1117/12.2024416
Show Author Affiliations
Ian Lacey, Lawrence Berkeley National Lab. (United States)
Nikolay A. Artemiev, Lawrence Berkeley National Lab. (United States)
Wayne R. McKinney, Lawrence Berkeley National Lab. (United States)
Daniel J. Merthe, Lawrence Berkeley National Lab. (United States)
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 8838:
Optical Manufacturing and Testing X
Oliver W. Fähnle; Ray Williamson; Dae Wook Kim, Editor(s)

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