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Proceedings Paper

Automatic optical detection and classification of submicron defects on e-beam mask blanks
Author(s): Richard Schneider; Dieter Spriegel
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Paper Abstract

The increasing integration of semiconductor circuits requires absolutely defect-free masks. Before their exposure to an c-beam writer the unstructured masks (blanks) have to be inspected in a clean room environment for particles on surfaces, pin-holes in the chromium layer and inclusions or scratches in the glass. Based on a HeNe laser scanner and by comparing relative directions and intensities of the scattered light, the position, size and type of defects were automatically classified. The criteria for classification will be explained. The smallest detectable defect diameter was 0.3 p.m. For presentation under a TV-microscope each defect could be located within 100 m.

Paper Details

Date Published: 1 August 1990
PDF: 7 pages
Proc. SPIE 1265, Industrial Inspection II, (1 August 1990); doi: 10.1117/12.20242
Show Author Affiliations
Richard Schneider, Siemens AG (Germany)
Dieter Spriegel, Siemens AG (Germany)


Published in SPIE Proceedings Vol. 1265:
Industrial Inspection II
Donald W. Braggins, Editor(s)

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