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Proceedings Paper

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength
Author(s): I. A. Makhotkin; R. W. E. van de Kruijs; E. Zoethout; E. Louis; F. Bijkerk
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Paper Abstract

In this article we present an overview of the optimization of LaN/B multilayers that enabled the deposition of a multilayer with a normal incidence reflectance of 57.3 % at 6.6 nm wavelength, the highest value reported to date. Two different ways of nitridation of the La layers were investigated: firstly N-ion post treatment of the La layer and secondly reactive magnetron sputtering of La in N2 atmosphere. Initially the optimization of the multilayers was performed for 50 period test multilayers, followed by the selection of the best process to study the stability of the full stack deposition and the optical performance of the mirrors. The scaling of reflectivity with increasing number of periods for LaN/B multilayer mirrors will also be discussed.

Paper Details

Date Published: 27 September 2013
PDF: 5 pages
Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 88480O (27 September 2013); doi: 10.1117/12.2024199
Show Author Affiliations
I. A. Makhotkin, FOM Institute DIFFER (Netherlands)
R. W. E. van de Kruijs, FOM Institute DIFFER (Netherlands)
E. Zoethout, FOM Institute DIFFER (Netherlands)
E. Louis, FOM Institute DIFFER (Netherlands)
Univ. Twente (Netherlands)
F. Bijkerk, FOM Institute DIFFER (Netherlands)
Univ. Twente (Netherlands)


Published in SPIE Proceedings Vol. 8848:
Advances in X-Ray/EUV Optics and Components VIII
Ali Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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