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Proceedings Paper

Optical property of obliquely deposited dielectric films upon a metamaterial thin film
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Paper Abstract

The equivalent electromagnetic parameters of a three-layered system Air/ Ta2O5 NRA (165nm)/ SiO2 NRA (133nm)/ Ag NRA(130nm) /BK7, fabricated by glancing angle deposition, are derived. The equivalent optical constants are used to estimate the optical performance that is achieved when additional films are deposited upon the NRA. First, the Ag NRA is deposited at a deposition angle of 89deg. An SiO2 NRA is then deposited at a deposition angle of -89deg. Finally a Ta2O5 NRA is deposited upon the SiO2 NRA at a deposition angle of 80deg. The reflectance and transmittance of the three-layered system Air/ Ta2O5 NRA (165nm)/ SiO2 NRA (133nm)/ Ag NRA(130nm) /BK7 glass are measured and compared with the theoretically estimated reflectance. At a wavelength of 568nm, the theoretically estimated p-polarization reflectance is 21.75%, which is close to the measured reflectance of 20.3%. A suitable arrangement of dielectric thin films upon a metamaterial thin film is demonstrated to induce p-polarized transmission.

Paper Details

Date Published: 19 September 2013
PDF: 6 pages
Proc. SPIE 8818, Nanostructured Thin Films VI, 88180T (19 September 2013); doi: 10.1117/12.2023988
Show Author Affiliations
Yi-Jun Jen, National Taipei Univ. of Technology (Taiwan)
Meng-Jie Lin, National Taipei Univ. of Technology (Taiwan)
Jia-Wei Dai, National Taipei Univ. of Technology (Taiwan)


Published in SPIE Proceedings Vol. 8818:
Nanostructured Thin Films VI
Tom G. Mackay; Akhlesh Lakhtakia; Yi-Jun Jen; Motofumi Suzuki, Editor(s)

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